JINXING MATECH CO LTD

JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel

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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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JINXING MATECH CO LTD
Country/Region:china
Contact Person:MrZHANG
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Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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Brand Name :JINXING
Model Number :Zirconium Sputtering Target
Certification :ISO 9001
Place of Origin :China
MOQ :1kg
Price :20~100USD/kg
Payment Terms :L/C, D/A, D/P, T/T, Western Union
Supply Ability :100000kgs/M
Delivery Time :10~25 work days
Packaging Details :Plywood case
Material :Zirconium Zr702
Process :HIP , CIP
Size :Customized
Application :PVD Coating
Density :6.506g/cm3
Shape :Round , Plate , Tube Sputtering target
Grain Size :Fine Grain Size
Purity :99.5% , 99.95%
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Zirconium Rotatable Sputtering Target

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Description

JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target and Evaporation material . Material incluidng ( Ti Titanium, TiAl, TiSi, TiZr , Zr Zirconium , Cr Chrome, Mo, W Tungsten, WTi , Cu, Ni, Ta, Nb ) .

  • Hot Pressing
  • Hot Isostatic Pressing (HIP)
  • Cold Isostatic Pressing (CIP)
  • Vacuum Sintering
  • Induction Melting
  • Vacuum Melting & Casting
  • Arc Melting
  • Electron-Beam Melting
  • Plasma Spraying
  • Co-Precipitation

JINXING has developed a complete line of rotary cathode sputtering targets. Materials are either continuously cast, extruded, HIP'ed or plasma sprayed to provide technological advances in rotary design. In addition, unique profiles can be developed for specific applications to provide targets for better wear characterization, longer life, unique physical characteristics or altered metallurgical properties.

Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target.

Grades: R60702, 99.2%min
Purity: 99.5%
Purity: 99.95% Hf<300ppm or Hf<4.5%)
Shape: Round Shape , Tube Shape and Plate Shape.

Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density

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