JINXING MATECH CO LTD

JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel

Manufacturer from China
Site Member
6 Years
Home / Products / Sputtering Targets /

Forged Zirconium Sputtering Target Zr702 Sputter Target

Contact Now
JINXING MATECH CO LTD
Country/Region:china
Contact Person:MrZHANG
Contact Now

Forged Zirconium Sputtering Target Zr702 Sputter Target

Ask Latest Price
Video Channel
Brand Name :JINXING
Model Number :Zirconium Target
Certification :ISO 9001
Place of Origin :China
MOQ :1kg
Payment Terms :L/C, D/A, D/P, T/T, Western Union
Supply Ability :100000kgs/M
Delivery Time :10~25 work days
Packaging Details :Plywood case
Application :PVD Coating, Decorative coating
Material :Zirconium Zr702
Process :Forged
Size :Customized
Density :6.506g/cm3
Shape :Round , Plate , Tube Sputtering target
Grain Size :Fine Grain Size
Purity :99.5% , 99.95%
more
Contact Now

Add to Cart

Find Similar Videos
View Product Description

Zirconium Sputtering Target Zr702 Sputter Target Online Catalog Source

Zirconium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Zr Sputtering Targets Manufacturer and Vendor, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Product Description

Zirconium Zr702 sputtering targets

Purity: 99.95%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Specification

Composition Zirconium Sputtering Target Sputter Target
Purity R60702, 3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%)
Density 6.50 g/cm3
Grain Sizes < 50 micron or on request
Fabrication Processes Vacuum melting, Forging, rolling, Machining
Shape Plate, Disc, Step, Custom Made
Types Monolithic, Multi-Segmented Target
Surface Ra 1.6 micron

Zirconium Sputtering Target ZrO2 Sputter Target Picture:

Forged Zirconium Sputtering Target Zr702 Sputter Target

Inquiry Cart 0